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## Exhibition Information 📅 Date: July 17–19, 2026 📍 Venue: China National Convention Center (No.7 Tianchen East Road, Chaoyang District, Beijing, China) 🌟 Event Overview The 7th World Photonics Conference (WPC2026), co-located with the 15th International Applied Optics and Photonics Conference (AOPC2026) and the 17th Optoelectronics Industry Expo, will be held at the China National Convention Center from July 17 to 19, 2026. It features comprehensive exhibition zones covering infrared low-light technologies & applications, laser & intelligent manufacturing, optical communication, optical sensing & IoT, optics & precision optical manufacturing, measurement & control technology and instruments, innovative technologies & laboratory achievements, micro-nano manufacturing, technological achievements of new quality productive forces, as well as the Beijing Semiconductor Exhibition. ## Booth Guide SimWorks Booth: **A106** Please refer to the attached floor plan for detailed location. We sincerely invite you to visit us and discuss the latest progress & practical simulation cases of SimWorks optoelectronics simulation software.  ## Exclusive Exhibition Benefits All visitors stopping by SimWorks Booth can receive a premium gift by participating in on-site interactive activities. Gifts are limited and available on a first-come, first-served basis. --- Let’s meet in Beijing this midsummer. SimWorks looks forward to connecting with you to explore new opportunities and a promising future for the optical and optoelectronics industry. ### Scan to Follow Our WeChat Service Account ### {{{width=200px height=auto}}}

Dear users: Thank you all for your attention and support to the SimWorks software. To further optimize the user experience and enhance the simulation quality, this software has been updated to version 3.5.0. **The key update contents this time are:** #### New `stack` Script Commands: Rapid Calculation of Optical Response for Planar Multilayer Film Stacks The new `stack` script commands provide fast analytical computation of the optical response of one-dimensional multilayer film structures based on the transfer matrix method (TMM). For dielectric structures that are laterally uniform and only layered along the thickness direction, this method assigns a transfer matrix to each layer, obtains the overall transfer matrix through matrix multiplication, and finally solves for reflectance, transmittance, and field distribution. This series currently includes the following two script commands: - `stackrt`: Calculates reflectance and transmittance under plane-wave incidence, returning power ratios and coefficients for S/P polarization. - `stackfield`: Computes the electric and magnetic field distribution inside the multilayer structure, supporting analysis of standing-wave patterns, absorption profiles, and field enhancement effects. Users only need to input the refractive index, thickness, frequency, and incidence angle of each layer to obtain results quickly. This command series is suitable for rapid preliminary evaluation in scenarios such as film design, VCSELs, OLEDs, and Bragg grating mirrors. The `stack` script functions offer significant advantages including high computation speed, no need for mesh generation, and high numerical accuracy, making them especially suitable for parameter sweeps and optimization iterations. The following figure shows the schematic principle and validation of calculation results for `stackrt`:  #### New Assembly Group Feature The Assembly Group is a special group type designed for efficiently creating complex structures composed of a large number of repeated or similar objects, such as metalens arrays. Its core concept is "define once, reuse multiple times"—by using a prototype object and a parameter mapping table, users can generate multiple instances in batch, significantly improving geometric construction and mesh generation speed. This feature is fully driven by scripts (supporting commands such as `addassemblygroup`, `addtogroup`, `setnamed`), and includes a built-in variant management mechanism (rotation and translation are treated as free variables and do not consume variant slots), greatly simplifying the design and simulation workflow for large-scale periodic or quasi-periodic structures.  #### New Conformal Variant CP‑EP0 Conformal Mesh Method CP‑EP0 (Contour Path Effective Permittivity 0) is a high‑accuracy conformal mesh technique for dielectric interfaces. For interface segments within a mesh cell, it weights contributions along the wave propagation direction (e.g., z‑axis) by length ratio and on the cross‑sectional plane (e.g., xy‑plane) by area ratio, thereby computing the equivalent permittivity of each cell accurately. This method can precisely capture curved interfaces of three‑dimensional complex structures even with a coarse mesh, significantly reducing meshing difficulty and memory consumption. For dielectric optoelectronic devices with curved boundaries—such as microlenses, waveguide couplers, and curved multilayer films—CP‑EP0 describes the interface refractive index distribution more accurately and faster than traditional volume‑averaged (V‑EP) and polarization‑dependent (VP‑EP) methods, making it an ideal choice for such scenarios.  #### Custom Time Signals for Light Sources via Script The new `setsourcesignal` script command allows users to specify a custom time‑domain pulse waveform for an existing light source in the solver. This command does not create a new source; it only modifies the time‑domain signal of the existing source while preserving its geometry, position, and other physical attributes, thus offering flexible waveform replacement on top of the current source. This feature is mainly targeted at applications requiring precise control of pulse temporal shapes, such as nonlinear optical simulations. Users can define amplitude and phase based on arbitrary time sequences, enabling non‑standard injection waveforms like double pulses, chirped pulses, rectangular pulses, or arbitrary modulated waveforms, providing greater flexibility for research that requires custom pulse shapes. Complete update content see - [Release Notes](https://www.simworks.net/en/release-note/-/v3.5), Welcome users to download to use - [Customer Downloads](https://www.simworks.net/en/trial-instruction) ! Shandong Guangfang Software Company has been deeply engaged in the development of optical simulation software for many years, committed to providing more professional and efficient simulation services. Once again, we thank you all for your attention and look forward to your feedback and valuable suggestions!

From May 18 to 20, 2026, SimWorks showcased its self-developed photoelectric simulation software, SimWorks, at the "Optics Valley" International Optoelectronic Exposition, drawing industry attention with its continuously iterated product strength, deep user trust, and open cooperation philosophy. ## Returning User Visits and Feedback During the exhibition, returning users such as **Hisilicon Optoelectronics, Shanghai Institute of Optics and Fine Mechanics (CAS), Huazhong University of Science and Technology, Westlake University, and Southern University of Science and Technology** visited the SimWorks booth. They showed interest in the version iteration progress of SimWorks, learning about improvements in computational efficiency, application scenario expansion, and functional optimization, and recognized the software's stability and innovation. This provides momentum for SimWorks to continue深耕 the field of photoelectric simulation and advance technological refinement.  ## New Exchanges and Collaborations with Enterprises and Universities During the exhibition, the SimWorks team engaged in discussions with industry peers and洽谈ed cooperation matters, achieving positive outcomes. At the enterprise level, representatives from **Wuhan Eryuan, Tianjin Huahui Core, Hangzhou Huaxin Optoelectronics**, and other photoelectric companies visited the booth. They discussed potential collaborations on the application of photoelectric simulation technology and industrial chain synergy, laying the groundwork for future cooperation.  At the university level, faculty and students from **The Chinese University of Hong Kong, Wuhan University of Technology, Wuhan Institute of Technology**, and other institutions visited the booth. They expressed interest in the software's development progress, its performance in catching up with international benchmarks, and its application and expansion in research projects.  ## Future Outlook During the exhibition, many sincere comments and suggestions were received. In the future, SimWorks will continue to focus on the field of photoelectric simulation, emphasizing version iteration and core function optimization to enhance product efficiency and accuracy, and working with industry peers to promote high-quality development of the photoelectric industry. ### Scan to Follow Our WeChat Service Account ### {{{width=200px height=auto}}}