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Setting FDCharge Simulation Control Panel

Finite Difference Charge Transport(FDCharge)solversimulation control panel

FDCharge Control Panel

This section introduces the FDCharge simulation control panel.

Finite Difference Charge Transport (FDCharge) solver resolves Poisson and carrier transport equations for active photonic devices and is suitable for simulating carrier transport in semiconductor devices.

The control panel contains buttons and displays for basic active-device settings and simulation information, as shown below:

Name Description
Design To Design: return to simulation design.
Progress Shows simulation progress.
Status Shows simulation status.
Run Run active (DC) simulation.
Tool Controls opening and clearing of data files.

FDCharge Feature

The FDCharge solver includes features different from passive solvers, such as independent doping settings and active-parameter monitors. The feature buttons are shown below:

Name Description
Constant Doping Add uniform doping; defines a region with uniform dopant concentration.
Diffusion Doping Add diffusion doping; define a region with dopant distribution function.
Import Generation Import generation rates produced by passive simulations (commonly used for photodetector designs).
Device Monitor Add device (active) parameter monitors to record optical/electrical fields in a region.
Analysis Group Add analysis groups.
Mesh Add custom mesh.
To Run Run simulation.

Doping

These FDCharge settings define doped semiconductors. Note: Doping applies only to semiconductor materials; doping in non-semiconductor regions is automatically ignored during computation, so you do not need to worry if a doping region overlaps non-semiconductor regions.

Two doping methods are supported: uniform (constant) doping and functional (diffusion) doping. Doping contributions are cumulative: if multiple doping objects apply to a region, the net doping is the sum of their concentrations. N-type and P-type dopants have opposite signs and will partially cancel each other.

Constant Doping

Defines a semiconductor region with a fixed dopant concentration. Users specify the geometry and parameters of the region.

Parameters:

Name Description
General Set the doping object's name.
X / Y / Z Set the center position and extent of the doping region.
Dopant Doping settings. Dopant Type: choose p for hole (acceptor) or n for electron (donor). Concentration: dopant concentration in atoms per cubic centimeter (cm3cm^{-3}).

Diffusion Doping

Functional doping defines concentration by a distribution function. Two distribution types are supported: 1) constant surface-source diffusion (erfc function) and 2) finite surface-source diffusion (gaussian function).

Parameters:

Name Description
Dopant Type Choose dopant type: p for holes (acceptors), n for electrons (donors).
Source Face The face where doping is injected.
Junction Width Width over which concentration drops from maximum to minimum according to the distribution.
Distribution Function Select the doping distribution function.
Concentration Maximum dopant concentration (atoms per cm3cm^{-3}).
Ref Concentration Minimum dopant concentration (atoms per cm3cm^{-3}).

Generation

Import Generation

This option imports photogeneration (generation rate) results produced by a passive simulation. It is commonly used in photodetector simulation designs.

Monitor

The FDCharge solver provides Device monitors (active parameter monitors). Monitors are typically set to match the FDCharge simulation region.

Device Monitor

Device monitors can record optical, electrical, and other related quantities. The available parameters are:

Name Physical Quantity Units Description
Electrostatics E V/m Electric field.
V V Electric Potential
Ei eV Intrinsic energy.
Ec eV Conduction band.
Bandstructure Ev eV Valence band.
Efn eV Electron quasi-Fermi level.
Efp eV Hole quasi-Fermi level.
ND cm3cm^{-3} Donor concentration.
Doping NA cm3cm^{-3} Acceptor concentration.
N cm3cm^{-3} Net doping density (N = NA - ND).
n cm3cm^{-3} Electron concentration.
p cm3cm^{-3} Hole concentration.
Charge np cm3cm^{-3} Charge product (np = sqrt(n * p)).
jn A/(cm2)A/(cm^{2}) Electron current density.
jp A/(cm2)A/(cm^{2}) Hole current density.
J A/(cm2)A/(cm^{2}) Total current density (jn - jp).
Recombination G s/cm3s/cm^{-3} Imported generation rate.
dn Change in n.
Delta Index dk Change in k.
Depsr Change in permittivity.